Suttichart, C., Boonyawan, D., Nhuapeng, W., & Thamjaree, W. (2018). Effect of a low gas pressure plasma treatment on copper substrate used for carbon nanotubes synthesis.
Chicago Style CitationSuttichart, C., D. Boonyawan, W. Nhuapeng, and W. Thamjaree. Effect of a Low Gas Pressure Plasma Treatment On Copper Substrate Used for Carbon Nanotubes Synthesis. 2018.
MLA引文Suttichart, C., D. Boonyawan, W. Nhuapeng, and W. Thamjaree. Effect of a Low Gas Pressure Plasma Treatment On Copper Substrate Used for Carbon Nanotubes Synthesis. 2018.
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