Premphet, P., Prasoetsri, M., Boonyawan, D., Supruangnet, R., Udomsom, S., & Leksakul, K. (2018). Optimization of DC magnetron sputtering deposition process and surface properties of HA-TiO<inf>2</inf> film.
استشهاد بنمط شيكاغوPremphet, P., M. Prasoetsri, D. Boonyawan, R. Supruangnet, S. Udomsom, و K. Leksakul. Optimization of DC Magnetron Sputtering Deposition Process and Surface Properties of HA-TiO<inf>2</inf> Film. 2018.
MLA استشهادPremphet, P., et al. Optimization of DC Magnetron Sputtering Deposition Process and Surface Properties of HA-TiO<inf>2</inf> Film. 2018.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.