Tantraviwat, D., Yamwong, W., Techakijkajorn, U., Imai, K., & Inceesungvorn, B. (2018). Schottky barrier height engineering of ti/n-type silicon diode by means of ion implantation.
استشهاد بنمط شيكاغوTantraviwat, Doldet, Wittawat Yamwong, Udom Techakijkajorn, Kazuo Imai, و Burapat Inceesungvorn. Schottky Barrier Height Engineering of Ti/n-type Silicon Diode By Means of Ion Implantation. 2018.
MLA استشهادTantraviwat, Doldet, et al. Schottky Barrier Height Engineering of Ti/n-type Silicon Diode By Means of Ion Implantation. 2018.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.