Tantraviwat, D., Yamwong, W., Techakijkajorn, U., Imai, K., & Inceesungvorn, B. (2018). Schottky barrier height engineering of ti/n-type silicon diode by means of ion implantation.
Chicago Style CitationTantraviwat, Doldet, Wittawat Yamwong, Udom Techakijkajorn, Kazuo Imai, and Burapat Inceesungvorn. Schottky Barrier Height Engineering of Ti/n-type Silicon Diode By Means of Ion Implantation. 2018.
MLA引文Tantraviwat, Doldet, et al. Schottky Barrier Height Engineering of Ti/n-type Silicon Diode By Means of Ion Implantation. 2018.
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