APA引文

N., P., R., N., M., L., T., S., S., S., & H.J., W. (2014). Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ions.

Chicago Style Citation

N., Puttaraksa, Norarat R., Laitinen M., Sajavaara T., Singkarat S., and Whitlow H.J. Lithography Exposure Characteristics of Poly(methyl Methacrylate) (PMMA) for Carbon, Helium and Hydrogen Ions. 2014.

MLA引文

N., Puttaraksa, et al. Lithography Exposure Characteristics of Poly(methyl Methacrylate) (PMMA) for Carbon, Helium and Hydrogen Ions. 2014.