N., P., R., N., M., L., T., S., S., S., & H.J., W. (2014). Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ions.
استشهاد بنمط شيكاغوN., Puttaraksa, Norarat R., Laitinen M., Sajavaara T., Singkarat S., و Whitlow H.J. Lithography Exposure Characteristics of Poly(methyl Methacrylate) (PMMA) for Carbon, Helium and Hydrogen Ions. 2014.
MLA استشهادN., Puttaraksa, et al. Lithography Exposure Characteristics of Poly(methyl Methacrylate) (PMMA) for Carbon, Helium and Hydrogen Ions. 2014.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.