Sahu, B. B., Kim, S. I., Lee, M. W., & Han, J. G. (2020). Effect of helium incorporation on plasma parameters and characteristic properties of hydrogen free carbon films deposited using DC magnetron sputtering.
استشهاد بنمط شيكاغوSahu, Bibhuti B., Sung I. Kim, Min W. Lee, و Jeon G. Han. Effect of Helium Incorporation On Plasma Parameters and Characteristic Properties of Hydrogen Free Carbon Films Deposited Using DC Magnetron Sputtering. 2020.
MLA استشهادSahu, Bibhuti B., Sung I. Kim, Min W. Lee, و Jeon G. Han. Effect of Helium Incorporation On Plasma Parameters and Characteristic Properties of Hydrogen Free Carbon Films Deposited Using DC Magnetron Sputtering. 2020.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.