Sahu, B. B., Kim, S. I., Lee, M. W., & Han, J. G. (2020). Effect of helium incorporation on plasma parameters and characteristic properties of hydrogen free carbon films deposited using DC magnetron sputtering.
Chicago Style CitationSahu, Bibhuti B., Sung I. Kim, Min W. Lee, and Jeon G. Han. Effect of Helium Incorporation On Plasma Parameters and Characteristic Properties of Hydrogen Free Carbon Films Deposited Using DC Magnetron Sputtering. 2020.
MLA引文Sahu, Bibhuti B., Sung I. Kim, Min W. Lee, and Jeon G. Han. Effect of Helium Incorporation On Plasma Parameters and Characteristic Properties of Hydrogen Free Carbon Films Deposited Using DC Magnetron Sputtering. 2020.
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