D., B., S., I., C., A., U., T., & L.D., Y. (2014). Formation of thin DLC films on SiO2/Si substrate using FCVAD technique.
Chicago Style CitationD., Bootkul, Intarasiri S., Aramwit C., Tippawan U., and Yu L.D. Formation of Thin DLC Films On SiO2/Si Substrate Using FCVAD Technique. 2014.
MLA引文D., Bootkul, et al. Formation of Thin DLC Films On SiO2/Si Substrate Using FCVAD Technique. 2014.
警告:這些引文格式不一定是100%准確.