An advanced fabrication method of highly ordered ZnO nanowire arrays on silicon substrates by atomic layer deposition

In this work, the controlled fabrication of highly ordered ZnO nanowire (NW) arrays on silicon substrates is reported. Si NWs fabricated by a combination of phase shift lithography and etching are used as a template and are subsequently substituted by ZnO NWs with a dry etching technique and atomic...

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Bibliographic Details
Main Authors: Kittitat Subannajui, Firat Güder, Julia Danhof, Andreas Menzel, Yang Yang, Lutz Kirste, Chunyu Wang, Volker Cimalla, Ulrich Schwarz, Margit Zacharias
Other Authors: Universitat Freiburg im Breisgau
Format: Article
Published: 2018
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Online Access:https://repository.li.mahidol.ac.th/handle/123456789/13913
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Institution: Mahidol University