Stability of Al2O3 and Al2O3/a- SiNx:H stacks for surface passivation of crystalline silicon

بواسطة Dingemans, G., Engelhart, P., Seguin, R., Einsele, F., Hoex, B., Van De Sanden, M.C.M., Kessels, W.M.M.
منشور في 2014