Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array

by Schaper, C.D., El-Awady, K., Kailath, T., Tay, A., Lee, L.L., Ho, W.K., Fuller, S.E.
Published 2014

Processing chemically amplified resists on advanced photomasks using a thermal array

by Schaper, C.D., El-Awady, K., Kailath, T., Tay, A., Lee, L.L., Ho, W.-K., Fuller, S.E.
Published 2014