Formation and characterization of magnetron sputtered Ta–Si–N–O thin films

by Xu, S., Chen, Z., Yan, H., Li, L., Ho, F. Y., Liang, M. H., Pan, J. S.
Published 2012

Atomic stacking configurations in atomic layer deposited TiN films

by Park, H. S., Lim, B. K., Liang, M. H., Sun, C. Q., Gao, W., Li, Sean, Dong, Zhili
Published 2012