Improvement of Electrical Properties of MOCVD HfO2 by Multistep Deposition

by Yeo, C.C., Cho, B.J., Joo, M.S., Whoang, S.J., Kwong, D.L., Bera, L.K., Mathew, S., Balasubramanian, N.
Published 2014

Formation of hafnium-aluminum-oxide gate dielectric using single cocktail liquid source in MOCVD process

by Joo, M.S., Cho, B.J., Yeo, C.C., Chan, D.S.H., Whoang, S.J., Mathew, S., Bera, L.K., Balasubramanian, N., Kwong, D.-L.
Published 2014