INFLUENCE OF SUBSTRATE TEMPERATURE AND ARGON FLOW RATE ON GROWTH OF TiO2 THIN FILMS BY MOCVD
This experiment identifies the influence of substrate temperature and Argon flow rate on growth of TiO2 thin films by MOCVD. Properties of thin films as well as <br /> <br /> <br /> crystal structure, surface morphology, stoichiometry, and growth rate were investigated with relat...
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| Format: | Final Project |
| Language: | Indonesia |
| Online Access: | https://digilib.itb.ac.id/gdl/view/20307 |
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| Institution: | Institut Teknologi Bandung |
| Language: | Indonesia |