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Plasmonic material is an alternative constituent material for optoelectronic devices, which utilizes physics phenomena of surface plasmon as working principle. Some examples of the plasmonic material application such as biosensor, solar cell, photodetector, and etc. In this research, we have investi...

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Main Author: RAMADHAN PRIBADI (NIM : 10213101), NAUFAL
Format: Final Project
Language:Indonesia
Online Access:https://digilib.itb.ac.id/gdl/view/23443
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Institution: Institut Teknologi Bandung
Language: Indonesia
id id-itb.:23443
spelling id-itb.:234432017-11-13T11:19:22Z#TITLE_ALTERNATIVE# RAMADHAN PRIBADI (NIM : 10213101), NAUFAL Indonesia Final Project INSTITUT TEKNOLOGI BANDUNG https://digilib.itb.ac.id/gdl/view/23443 Plasmonic material is an alternative constituent material for optoelectronic devices, which utilizes physics phenomena of surface plasmon as working principle. Some examples of the plasmonic material application such as biosensor, solar cell, photodetector, and etc. In this research, we have investigated plasmonic state of Cu thin films on plasmon energy and dielectric constant changed with varying thickness of thin films and treating hydrogen plasma annealing. Cu thin films were deposited on SiO2 substrate using thermal evaporation method on three samples with different thickness, obtained rough topography and metal islands-like on sample surface, and after treated by hydrogen plasma annealing, surface has smoothened and metal islands has removed. Sample was characterized using spectroscopic ellipsometry in the energy ranges 0.6 – 6.5 eV, and measurement results are extracted by optical model fitting of measurement results using CompleteEASE software into dielectric constant and energy loss function values. Energy loss function shows Cu thin films surface plasmon energy value. Cu thin films surface plasmon energy is shifted to lower energy (redshift) due to higher thickness. Effect of hydrogen plasma annealing on Cu thin films removed localized surface plasmon which arise after deposition using thermal evaporation method, and surface plasmon energy is shifted to the higher energy (blueshift). text
institution Institut Teknologi Bandung
building Institut Teknologi Bandung Library
continent Asia
country Indonesia
Indonesia
content_provider Institut Teknologi Bandung
collection Digital ITB
language Indonesia
description Plasmonic material is an alternative constituent material for optoelectronic devices, which utilizes physics phenomena of surface plasmon as working principle. Some examples of the plasmonic material application such as biosensor, solar cell, photodetector, and etc. In this research, we have investigated plasmonic state of Cu thin films on plasmon energy and dielectric constant changed with varying thickness of thin films and treating hydrogen plasma annealing. Cu thin films were deposited on SiO2 substrate using thermal evaporation method on three samples with different thickness, obtained rough topography and metal islands-like on sample surface, and after treated by hydrogen plasma annealing, surface has smoothened and metal islands has removed. Sample was characterized using spectroscopic ellipsometry in the energy ranges 0.6 – 6.5 eV, and measurement results are extracted by optical model fitting of measurement results using CompleteEASE software into dielectric constant and energy loss function values. Energy loss function shows Cu thin films surface plasmon energy value. Cu thin films surface plasmon energy is shifted to lower energy (redshift) due to higher thickness. Effect of hydrogen plasma annealing on Cu thin films removed localized surface plasmon which arise after deposition using thermal evaporation method, and surface plasmon energy is shifted to the higher energy (blueshift).
format Final Project
author RAMADHAN PRIBADI (NIM : 10213101), NAUFAL
spellingShingle RAMADHAN PRIBADI (NIM : 10213101), NAUFAL
#TITLE_ALTERNATIVE#
author_facet RAMADHAN PRIBADI (NIM : 10213101), NAUFAL
author_sort RAMADHAN PRIBADI (NIM : 10213101), NAUFAL
title #TITLE_ALTERNATIVE#
title_short #TITLE_ALTERNATIVE#
title_full #TITLE_ALTERNATIVE#
title_fullStr #TITLE_ALTERNATIVE#
title_full_unstemmed #TITLE_ALTERNATIVE#
title_sort #title_alternative#
url https://digilib.itb.ac.id/gdl/view/23443
_version_ 1821121073794514944