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This thesis studies about contact resistance on copper conductor contact relative to plating materials, plating thickness, and contact pressure. This study is important because conductor contact plays an important role on electric distribution performance. A good conductor contact would have low con...
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| 主要作者: | |
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| 格式: | Final Project |
| 語言: | Indonesia |
| 在線閱讀: | https://digilib.itb.ac.id/gdl/view/23453 |
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| 機構: | Institut Teknologi Bandung |
| 語言: | Indonesia |