EFFECT OF HYDROGEN PLASMA TREATMENT ON STRUCTURAL AND OPTICAL PROPERTIES OF DyScO3 MATERIAL

• Main Author: ZULFA KHAIRUNNISA (NIM: 10212045), SARAH
• Format: Final Project
• Language: Indonesia
• Online Access: https://digilib.itb.ac.id/gdl/view/24220
• Institution: Institut Teknologi Bandung

Characterization study of structural and optical properties of DyScO3 material has been done using XRD, FTIR, AFM, and SE (Spectroscopy Ellipsometry). DyScO3 material grown using Czochralski method have potentials as a substrate and a thin film material. High dielectric constant, wide bandgap, and high thermal expansion constant are several advantages that have been reported from DyScO3 material. <br /> <br /> However, hydrogen plasma treatment as one of the parameter in this study gives some changes in the nature of structural and optical properties as seen from the characterization results. Hydrogen plasma (H+) would interact with the substrate surface that contains O- from DyScO3 material. <br /> <br /> XRD characterization indicate that material DyScO3 has a high crystalinity. As for the characterization using FTIR, the absorbance result introduces a significant change because given HPT. While AFM characterization results give more uniform substrate surface after exerts Hydrogen Plasma Treatment (HPT) and SE results show an increase in the optical conductivity followed by a decrease of the optical bandgap. So the HPT given makes substrate surface more smooth (smoothing process) and also increase the conductivity (annealing process) with sputter-off, evaporative and lit-of mechanism. However, this hydrogen plasma treatment will be a preliminary study conducted on DyScO3 substrate using spectroscopy ellipsometry.