STUDY OF CURRENT DENSITY, WAVEFORM, AND CUSO\TEXTSUBSCRIPT{4} CONCENTRATION EFFECT ON CU-MN LAYER FABRICATED TO AISI 430 WITH PULSED CURRENT ELECTRODEPOSITION METHOD

STUDY OF CURRENT DENSITY, WAVEFORM, AND CUSO\TEXTSUBSCRIPT{4} CONCENTRATION EFFECT ON CU-MN LAYER FABRICATED TO AISI 430 WITH PULSED CURRENT ELECTRODEPOSITION METHOD

Saved in:
Bibliographic Details
Main Author: Muhammad Herwandi, Naufal
Format: Final Project
Language:Indonesia
Online Access:https://digilib.itb.ac.id/gdl/view/58937
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Institut Teknologi Bandung
Language: Indonesia
id id-itb.:58937
spelling id-itb.:589372021-09-07T09:56:57ZSTUDY OF CURRENT DENSITY, WAVEFORM, AND CUSO\TEXTSUBSCRIPT{4} CONCENTRATION EFFECT ON CU-MN LAYER FABRICATED TO AISI 430 WITH PULSED CURRENT ELECTRODEPOSITION METHOD Muhammad Herwandi, Naufal Indonesia Final Project MT14 INSTITUT TEKNOLOGI BANDUNG https://digilib.itb.ac.id/gdl/view/58937 text
institution Institut Teknologi Bandung
building Institut Teknologi Bandung Library
continent Asia
country Indonesia
Indonesia
content_provider Institut Teknologi Bandung
collection Digital ITB
language Indonesia
description
format Final Project
author Muhammad Herwandi, Naufal
spellingShingle Muhammad Herwandi, Naufal
STUDY OF CURRENT DENSITY, WAVEFORM, AND CUSO\TEXTSUBSCRIPT{4} CONCENTRATION EFFECT ON CU-MN LAYER FABRICATED TO AISI 430 WITH PULSED CURRENT ELECTRODEPOSITION METHOD
author_facet Muhammad Herwandi, Naufal
author_sort Muhammad Herwandi, Naufal
title STUDY OF CURRENT DENSITY, WAVEFORM, AND CUSO\TEXTSUBSCRIPT{4} CONCENTRATION EFFECT ON CU-MN LAYER FABRICATED TO AISI 430 WITH PULSED CURRENT ELECTRODEPOSITION METHOD
title_short STUDY OF CURRENT DENSITY, WAVEFORM, AND CUSO\TEXTSUBSCRIPT{4} CONCENTRATION EFFECT ON CU-MN LAYER FABRICATED TO AISI 430 WITH PULSED CURRENT ELECTRODEPOSITION METHOD
title_full STUDY OF CURRENT DENSITY, WAVEFORM, AND CUSO\TEXTSUBSCRIPT{4} CONCENTRATION EFFECT ON CU-MN LAYER FABRICATED TO AISI 430 WITH PULSED CURRENT ELECTRODEPOSITION METHOD
title_fullStr STUDY OF CURRENT DENSITY, WAVEFORM, AND CUSO\TEXTSUBSCRIPT{4} CONCENTRATION EFFECT ON CU-MN LAYER FABRICATED TO AISI 430 WITH PULSED CURRENT ELECTRODEPOSITION METHOD
title_full_unstemmed STUDY OF CURRENT DENSITY, WAVEFORM, AND CUSO\TEXTSUBSCRIPT{4} CONCENTRATION EFFECT ON CU-MN LAYER FABRICATED TO AISI 430 WITH PULSED CURRENT ELECTRODEPOSITION METHOD
title_sort study of current density, waveform, and cuso\textsubscript{4} concentration effect on cu-mn layer fabricated to aisi 430 with pulsed current electrodeposition method
url https://digilib.itb.ac.id/gdl/view/58937
_version_ 1822003091125305344

Similar Items