Effects of rf power on structural properties of Nc-Si:H thin films deposited by layer-by-layer (LbL) deposition technique

The effects of rf power on the structural properties of hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited using layer-by-layer (LbL) deposition technique in a home-built plasma enhanced chemical vapor deposition (PECVD) system were investigated. The properties of the films were cha...

Full description

Saved in:
Bibliographic Details
Main Authors: Goh, Boon Tong, Muhamad Rasat Muhamad, Saadah Abdul Rahman
Format: Article
Language:English
Published: Universiti Kebangsaan Malaysia 2012
Online Access:http://journalarticle.ukm.my/5420/1/08%2520Goh%2520Boon.pdf
http://journalarticle.ukm.my/5420/
http://www.ukm.my/jsm/
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Universiti Kebangsaan Malaysia
Language: English