Design and fabrication stable LNF contact for future IC application

• Main Authors: Bhuiyan, Md. Moinul Islam, Rashid, Muhammad Mahbubur, Ahmed, Sayem, Bhuiyan, Munira, Kajihara, Masanori
• Format: Conference or Workshop Item
• Language: English; English
• Published: 2013
• Subjects: TA165 Engineering instruments, meters, etc. Industrial instrumentation
• Online Access: http://irep.iium.edu.my/33345/1/2119_Design_and_Fabrication_Stable_LNF_Contact_for_Future_IC.pdf; http://irep.iium.edu.my/33345/2/ICOM13_Programme_Book.pdf; http://irep.iium.edu.my/33345/; http://www.iium.edu.my/icom2013/13/
• Institution: Universiti Islam Antarabangsa Malaysia

Enable the design of a small contact spring for applications requiring high density, high speed and high durability. A low normal force (LNF) contact spring with high performance is fabricated using a unique combined MEMS photo resist lithography and electro fine forming (EFF) technology. Reducing a total contact material cost of a connector, a high- Hertz stress with LNF contact will be a key technology in the future. Only radius R 5m tip with 0.1N force contact provides an excellent electrical performance which is much sharper than conventional contact. 0.30million cycle’s durability test was passed at 300m displacement and the contact resistance was ≦50mΩ.