A low normal force contact using photolithography and Ni-Co electro fine forming technology

This new technology is realized by Photo Resist Lithography and Ni-Co Electro Fine Forming technology, and enables the design of a small contact spring for applications requiring high density, high speed and high durability. The evaluation result proved the capability of Low Normal Force (0.10N-0....

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Main Authors:	Bhuiyan, Moinul, Takemasa, Eiichiro
Format:	Conference or Workshop Item
Language:	English English
Published:	2009
Subjects:	TA165 Engineering instruments, meters, etc. Industrial instrumentation
Online Access:	http://irep.iium.edu.my/33437/1/A_Low_Normal_Force_Contact_using_Photolithography_and_Ni-Co_Electro_Fine_Forming_Technology.pdf http://irep.iium.edu.my/33437/2/Tech._Paper_Conf._Spring2009_20090515.pdf http://irep.iium.edu.my/33437/
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Institution:	Universiti Islam Antarabangsa Malaysia
Language:	English English

id	my.iium.irep.33437
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spelling	my.iium.irep.334372023-05-16T07:23:02Z http://irep.iium.edu.my/33437/ A low normal force contact using photolithography and Ni-Co electro fine forming technology Bhuiyan, Moinul Takemasa, Eiichiro TA165 Engineering instruments, meters, etc. Industrial instrumentation This new technology is realized by Photo Resist Lithography and Ni-Co Electro Fine Forming technology, and enables the design of a small contact spring for applications requiring high density, high speed and high durability. The evaluation result proved the capability of Low Normal Force (0.10N-0.15N at 0.3mm) at contact point (5μm radius), durability of 100,000 contact cycles (less than 50m�). The particle size of the Ni-Co crystal must be less than 100nm as measured by STEM. 2009-05-14 Conference or Workshop Item PeerReviewed application/pdf en http://irep.iium.edu.my/33437/1/A_Low_Normal_Force_Contact_using_Photolithography_and_Ni-Co_Electro_Fine_Forming_Technology.pdf application/pdf en http://irep.iium.edu.my/33437/2/Tech._Paper_Conf._Spring2009_20090515.pdf Bhuiyan, Moinul and Takemasa, Eiichiro (2009) A low normal force contact using photolithography and Ni-Co electro fine forming technology. In: TE-Japan Technical Conference, 14 May 2009, Kawasaki, Japan.
institution	Universiti Islam Antarabangsa Malaysia
building	IIUM Library
collection	Institutional Repository
continent	Asia
country	Malaysia
content_provider	International Islamic University Malaysia
content_source	IIUM Repository (IREP)
url_provider	http://irep.iium.edu.my/
language	English English
topic	TA165 Engineering instruments, meters, etc. Industrial instrumentation
spellingShingle	TA165 Engineering instruments, meters, etc. Industrial instrumentation Bhuiyan, Moinul Takemasa, Eiichiro A low normal force contact using photolithography and Ni-Co electro fine forming technology
description	This new technology is realized by Photo Resist Lithography and Ni-Co Electro Fine Forming technology, and enables the design of a small contact spring for applications requiring high density, high speed and high durability. The evaluation result proved the capability of Low Normal Force (0.10N-0.15N at 0.3mm) at contact point (5μm radius), durability of 100,000 contact cycles (less than 50m�). The particle size of the Ni-Co crystal must be less than 100nm as measured by STEM.
format	Conference or Workshop Item
author	Bhuiyan, Moinul Takemasa, Eiichiro
author_facet	Bhuiyan, Moinul Takemasa, Eiichiro
author_sort	Bhuiyan, Moinul
title	A low normal force contact using photolithography and Ni-Co electro fine forming technology
title_short	A low normal force contact using photolithography and Ni-Co electro fine forming technology
title_full	A low normal force contact using photolithography and Ni-Co electro fine forming technology
title_fullStr	A low normal force contact using photolithography and Ni-Co electro fine forming technology
title_full_unstemmed	A low normal force contact using photolithography and Ni-Co electro fine forming technology
title_sort	low normal force contact using photolithography and ni-co electro fine forming technology
publishDate	2009
url	http://irep.iium.edu.my/33437/1/A_Low_Normal_Force_Contact_using_Photolithography_and_Ni-Co_Electro_Fine_Forming_Technology.pdf http://irep.iium.edu.my/33437/2/Tech._Paper_Conf._Spring2009_20090515.pdf http://irep.iium.edu.my/33437/
_version_	1768006344403582976

A low normal force contact using photolithography and Ni-Co electro fine forming technology

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