Reactive dyes removal using plant-based surfactant in micellar-enhanced microfiltration (MEMF) / Siti Wahidah Puasa

Textile industry has grown to become one of the important industries in Malaysia. Reactive dyes are extensively used in textile industry since these dyes are being recognized as the best dyes used for dyeing cotton and cellulosic fiber. However, reactive dyes have low fixation rate and therefore fac...

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Bibliographic Details
Main Author: Puasa, Siti Wahidah
Format: Book Section
Language:English
Published: Institute of Graduate Studies, UiTM 2016
Subjects:
Online Access:http://ir.uitm.edu.my/id/eprint/20113/1/ABS_SITI%20WAHIDAH%20PUASA%20TDRA%20VOL%2010%20IGS%2016.pdf
http://ir.uitm.edu.my/id/eprint/20113/
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Institution: Universiti Teknologi Mara
Language: English
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Summary:Textile industry has grown to become one of the important industries in Malaysia. Reactive dyes are extensively used in textile industry since these dyes are being recognized as the best dyes used for dyeing cotton and cellulosic fiber. However, reactive dyes have low fixation rate and therefore facing the highest loss in dyeing process. Most of these dyes have complex structures that resist degradation in conventional wastewater treatment process. Due to these factors, it is an urgent need to find a way to preserve the environment while keeping the economic growing. In this study, the removal of C.I Reactive Black 5 (RB5) and C.I Reactive Orange 16 using plant based esterquat surfactant (PBE and VBE) via micellar-enhanced microfiltration (MEMF) was investigated. FTIR confirms the existence of functional group and interaction occurred between dyes and esterquat surfactant. The Critical Micelle Concentration of PBE and VBE surfactant obtained was at range of 93 to 97 mg/L and 152 to 159 mg/L via conductivity method and UV-Vis spectrophotometric method. It is verified that the developed simplified method for analysis of surfactant concentration is in a good agreement with the existing colourimetric method. The micelles was formed in vesicle arrangement with particle diameter at size range from 140 to 1500 nm…