Investigation of stress effect technology on electrical characteristics of 90nm CMOS devices / Hanim Hussin, Ahmad Sabirin Zoolfakar and Rosmalini Ab Kadir

The implementation of this research is to find a solution for CMOS devices problems related to hot carrier effect due to advanced technology node where the devices are scaled in nano-region. Stress effect or known as strained silicon technology is capable to increase performance of CMOS devices in t...

Full description

Saved in:
Bibliographic Details
Main Authors: Hussin, Hanim, Zoolfakar, Ahmad Sabirin, Ab Kadir, Rosmalini
Format: Research Reports
Language:English
Published: 2011
Subjects:
Online Access:https://ir.uitm.edu.my/id/eprint/61681/1/61681.pdf
https://ir.uitm.edu.my/id/eprint/61681/
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Universiti Teknologi Mara
Language: English

Similar Items