Comparison of oxidized/nitrided Zr thin films on Si and SiC substrates

This work utilizes simultaneous thermal oxidation and nitridation technique to transform sputtered Zr to ZrO2 and to Zr-oxynitride thin films on Si and SiC substrates, respectively, in nitrous oxide gas ambient. Various characterization techniques such as X-ray photoelectron spectroscopy, energy-fil...

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Bibliographic Details
Main Authors: Wong, Y.H., Cheong, K.Y.
Format: Article
Published: Elsevier 2013
Subjects:
Online Access:http://eprints.um.edu.my/13007/
http://www.sciencedirect.com/science/article/pii/S0272884212010802
http://dx.doi.org/10.1016/j.ceramint.2012.10.117
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Institution: Universiti Malaya