Structural characteristics of samarium oxynitride on silicon substrate

Thermal oxynitridation of 20 nm sputtered pure samarium metal film on silicon substrates were carried out in nitrous oxide gas ambient at various temperatures (600–900 °C) for 15 min. Influences of the oxynitridation temperature on the structural and chemical properties of the SmxOyNz films had been...

Full description

Saved in:
Bibliographic Details
Main Authors: Goh, K.H., Haseeb, A.S. Md. Abdul, Wong, Y.H.
Format: Article
Published: Elsevier 2017
Subjects:
Online Access:http://eprints.um.edu.my/17554/
https://doi.org/10.1016/j.jallcom.2017.06.179
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Universiti Malaya