Structural and mechanical properties of a-axis AlN thin films growth using reactive RF magnetron sputtering plasma

• Main Authors: Bakri, Anis Suhaili, Nayan, Nafarizal, Soon, Chin Fhong, Ahmad, Mohd Khairul, Abu Bakar, Ahmad Shuhaimi, Abd Majid, Wan Haliza, Raship, Nur Amaliyana
• Format: Article
• Published: Emerald 2021
• Subjects: Q Science (General); QC Physics; QD Chemistry
• Online Access: http://eprints.um.edu.my/28802/
• Institution: Universiti Malaya

This paper aims to report the influence of sputtering plasma deposition time on the structural and mechanical properties of the a-axis oriented aluminium nitride (AlN) thin films. Design/methodology/approach The AlN films were prepared using RF magnetron sputtering plasma on a silicon substrate with...