Resistless nano-etching of UV-irradiated vinyl-functional silsesquioxane thin film by alcohol-alkaline solution

• Main Authors: Zainuddin, M.T., Mohamad, S.M., Zainon, N.M., Bakar, S.A., Basha, N.S.K., Jamil, F.M., Tajuddin, Hairul Anuar
• Format: Article
• Published: International Scientific Organization 2021
• Subjects: Q Science (General); QD Chemistry; T Technology (General); TP Chemical technology
• Online Access: http://eprints.um.edu.my/36101/; https://www.scopus.com/inward/record.uri?eid=2-s2.0-85130202659&partnerID=40&md5=8ea99d902abab84e07417db95b3672d3
• Institution: Universiti Malaya

Defining optical thin film-based components such as waveguides, microlens, etc. typically encounter dimensional-based challenges especially when it comes to nano-dimensional features processing. This work focused on the optimization of wet etching process on the photosensitive organic-inorganic thin...