Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film
Thin film technologies in terms of preparation and fabrication are of great importance in various fields, such as integrated circuits (IC), LCD monitors, photovoltaics, solar cells and sensors. Tellurium, as a narrow bandgap semiconductor, has attracted much attention due to its rich optical and ele...
Saved in:
Main Authors: | , , , , , , , |
---|---|
Format: | Article |
Published: |
Elsevier Science Sa
2022
|
Subjects: | |
Online Access: | http://eprints.um.edu.my/40385/ |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Universiti Malaya |
id |
my.um.eprints.40385 |
---|---|
record_format |
eprints |
spelling |
my.um.eprints.403852023-11-22T06:49:12Z http://eprints.um.edu.my/40385/ Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film Yang, Fan Liu, Qiulin Li, Guodong Zhang, Xiaofan Rozali, Shaifulazuar Nik Ghazali, Nik Nazri Mohd Sabri, Mohd Faizul Zhao, Huaizhou TJ Mechanical engineering and machinery Thin film technologies in terms of preparation and fabrication are of great importance in various fields, such as integrated circuits (IC), LCD monitors, photovoltaics, solar cells and sensors. Tellurium, as a narrow bandgap semiconductor, has attracted much attention due to its rich optical and electrical properties. Taking advantage of these properties, its films have been explored in recent years as saturable absorbers, gas sensors, and ther-moelectric materials. However, it is challenging to control the growth of the specific morphology of tellurium films. In this work, based on the electrodeposition challenge, we systematically investigated the electrodepo-sition process of tellurium films. It was found that the CV curves of electrodeposited tellurium shift in the pos-itive direction with increasing deposition time. In addition, the stabilized potential was determined based on the stable deposition peak potential after a certain deposition time. Moreover, three different additives, namely polyvinyl alcohol (PVA), tartaric acid (TA) and sodium lignosulfonate (SLS), were adopted to manipulate the morphology of as-deposited tellurium films. A rational route to deposit tellurium films with various morpholo-gies have been established. Elsevier Science Sa 2022-11-15 Article PeerReviewed Yang, Fan and Liu, Qiulin and Li, Guodong and Zhang, Xiaofan and Rozali, Shaifulazuar and Nik Ghazali, Nik Nazri and Mohd Sabri, Mohd Faizul and Zhao, Huaizhou (2022) Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film. Journal of Electroanalytical Chemistry, 925. ISSN 1572-6657, DOI https://doi.org/10.1016/j.jelechem.2022.116872 <https://doi.org/10.1016/j.jelechem.2022.116872>. 10.1016/j.jelechem.2022.116872 |
institution |
Universiti Malaya |
building |
UM Library |
collection |
Institutional Repository |
continent |
Asia |
country |
Malaysia |
content_provider |
Universiti Malaya |
content_source |
UM Research Repository |
url_provider |
http://eprints.um.edu.my/ |
topic |
TJ Mechanical engineering and machinery |
spellingShingle |
TJ Mechanical engineering and machinery Yang, Fan Liu, Qiulin Li, Guodong Zhang, Xiaofan Rozali, Shaifulazuar Nik Ghazali, Nik Nazri Mohd Sabri, Mohd Faizul Zhao, Huaizhou Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film |
description |
Thin film technologies in terms of preparation and fabrication are of great importance in various fields, such as integrated circuits (IC), LCD monitors, photovoltaics, solar cells and sensors. Tellurium, as a narrow bandgap semiconductor, has attracted much attention due to its rich optical and electrical properties. Taking advantage of these properties, its films have been explored in recent years as saturable absorbers, gas sensors, and ther-moelectric materials. However, it is challenging to control the growth of the specific morphology of tellurium films. In this work, based on the electrodeposition challenge, we systematically investigated the electrodepo-sition process of tellurium films. It was found that the CV curves of electrodeposited tellurium shift in the pos-itive direction with increasing deposition time. In addition, the stabilized potential was determined based on the stable deposition peak potential after a certain deposition time. Moreover, three different additives, namely polyvinyl alcohol (PVA), tartaric acid (TA) and sodium lignosulfonate (SLS), were adopted to manipulate the morphology of as-deposited tellurium films. A rational route to deposit tellurium films with various morpholo-gies have been established. |
format |
Article |
author |
Yang, Fan Liu, Qiulin Li, Guodong Zhang, Xiaofan Rozali, Shaifulazuar Nik Ghazali, Nik Nazri Mohd Sabri, Mohd Faizul Zhao, Huaizhou |
author_facet |
Yang, Fan Liu, Qiulin Li, Guodong Zhang, Xiaofan Rozali, Shaifulazuar Nik Ghazali, Nik Nazri Mohd Sabri, Mohd Faizul Zhao, Huaizhou |
author_sort |
Yang, Fan |
title |
Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film |
title_short |
Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film |
title_full |
Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film |
title_fullStr |
Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film |
title_full_unstemmed |
Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film |
title_sort |
effect of additives and optimized cyclic voltammetry parameters on the morphology of electrodeposited tellurium thin film |
publisher |
Elsevier Science Sa |
publishDate |
2022 |
url |
http://eprints.um.edu.my/40385/ |
_version_ |
1783876706283552768 |