Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film

Thin film technologies in terms of preparation and fabrication are of great importance in various fields, such as integrated circuits (IC), LCD monitors, photovoltaics, solar cells and sensors. Tellurium, as a narrow bandgap semiconductor, has attracted much attention due to its rich optical and ele...

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Main Authors: Yang, Fan, Liu, Qiulin, Li, Guodong, Zhang, Xiaofan, Rozali, Shaifulazuar, Nik Ghazali, Nik Nazri, Mohd Sabri, Mohd Faizul, Zhao, Huaizhou
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Published: Elsevier Science Sa 2022
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Online Access:http://eprints.um.edu.my/40385/
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spelling my.um.eprints.403852023-11-22T06:49:12Z http://eprints.um.edu.my/40385/ Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film Yang, Fan Liu, Qiulin Li, Guodong Zhang, Xiaofan Rozali, Shaifulazuar Nik Ghazali, Nik Nazri Mohd Sabri, Mohd Faizul Zhao, Huaizhou TJ Mechanical engineering and machinery Thin film technologies in terms of preparation and fabrication are of great importance in various fields, such as integrated circuits (IC), LCD monitors, photovoltaics, solar cells and sensors. Tellurium, as a narrow bandgap semiconductor, has attracted much attention due to its rich optical and electrical properties. Taking advantage of these properties, its films have been explored in recent years as saturable absorbers, gas sensors, and ther-moelectric materials. However, it is challenging to control the growth of the specific morphology of tellurium films. In this work, based on the electrodeposition challenge, we systematically investigated the electrodepo-sition process of tellurium films. It was found that the CV curves of electrodeposited tellurium shift in the pos-itive direction with increasing deposition time. In addition, the stabilized potential was determined based on the stable deposition peak potential after a certain deposition time. Moreover, three different additives, namely polyvinyl alcohol (PVA), tartaric acid (TA) and sodium lignosulfonate (SLS), were adopted to manipulate the morphology of as-deposited tellurium films. A rational route to deposit tellurium films with various morpholo-gies have been established. Elsevier Science Sa 2022-11-15 Article PeerReviewed Yang, Fan and Liu, Qiulin and Li, Guodong and Zhang, Xiaofan and Rozali, Shaifulazuar and Nik Ghazali, Nik Nazri and Mohd Sabri, Mohd Faizul and Zhao, Huaizhou (2022) Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film. Journal of Electroanalytical Chemistry, 925. ISSN 1572-6657, DOI https://doi.org/10.1016/j.jelechem.2022.116872 <https://doi.org/10.1016/j.jelechem.2022.116872>. 10.1016/j.jelechem.2022.116872
institution Universiti Malaya
building UM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaya
content_source UM Research Repository
url_provider http://eprints.um.edu.my/
topic TJ Mechanical engineering and machinery
spellingShingle TJ Mechanical engineering and machinery
Yang, Fan
Liu, Qiulin
Li, Guodong
Zhang, Xiaofan
Rozali, Shaifulazuar
Nik Ghazali, Nik Nazri
Mohd Sabri, Mohd Faizul
Zhao, Huaizhou
Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film
description Thin film technologies in terms of preparation and fabrication are of great importance in various fields, such as integrated circuits (IC), LCD monitors, photovoltaics, solar cells and sensors. Tellurium, as a narrow bandgap semiconductor, has attracted much attention due to its rich optical and electrical properties. Taking advantage of these properties, its films have been explored in recent years as saturable absorbers, gas sensors, and ther-moelectric materials. However, it is challenging to control the growth of the specific morphology of tellurium films. In this work, based on the electrodeposition challenge, we systematically investigated the electrodepo-sition process of tellurium films. It was found that the CV curves of electrodeposited tellurium shift in the pos-itive direction with increasing deposition time. In addition, the stabilized potential was determined based on the stable deposition peak potential after a certain deposition time. Moreover, three different additives, namely polyvinyl alcohol (PVA), tartaric acid (TA) and sodium lignosulfonate (SLS), were adopted to manipulate the morphology of as-deposited tellurium films. A rational route to deposit tellurium films with various morpholo-gies have been established.
format Article
author Yang, Fan
Liu, Qiulin
Li, Guodong
Zhang, Xiaofan
Rozali, Shaifulazuar
Nik Ghazali, Nik Nazri
Mohd Sabri, Mohd Faizul
Zhao, Huaizhou
author_facet Yang, Fan
Liu, Qiulin
Li, Guodong
Zhang, Xiaofan
Rozali, Shaifulazuar
Nik Ghazali, Nik Nazri
Mohd Sabri, Mohd Faizul
Zhao, Huaizhou
author_sort Yang, Fan
title Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film
title_short Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film
title_full Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film
title_fullStr Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film
title_full_unstemmed Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film
title_sort effect of additives and optimized cyclic voltammetry parameters on the morphology of electrodeposited tellurium thin film
publisher Elsevier Science Sa
publishDate 2022
url http://eprints.um.edu.my/40385/
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