Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. Power

Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. Power

Silicon carbon films were deposited using a hybrid radio frequency (r.f.) plasma enhanced chemical vapor deposition (PECVD)/sputtering deposition system at different r.f. powers. This deposition system combines the advantages of r.f. PECVD and sputtering techniques for the deposition of silicon carb...

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Bibliographic Details
Main Authors: Rashid, N.M.A., Ritikos, R., Othman, M., Khanis, N.H., Gani, S.M.A., Muhamad, M.R., Rahman, S.A.
Format: Article
Published: 2013
Subjects:
QC Physics
Online Access:http://eprints.um.edu.my/7185/
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Institution: Universiti Malaya

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http://eprints.um.edu.my/7185/

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