Influence of film thickness on the structural, electrical and photoluminescence properties of vacuum deposited Alq(3) thin films on c-silicon substrate

In this work. the influence of film thickness on the structural, electrical and photoluminescence (PL) properties of tris (8-hydroxyquinoline) aluminum (Alq(3)) films prepared by vacuum evaporation technique on crystal silicon (c-Si) substrate were studied. Fourier transform infrared (FTIR) spectros...

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Bibliographic Details
Main Authors: Koay, J.Y., Sharif K., A.M., Rahman, S.A.
Format: Article
Published: 2009
Subjects:
Online Access:http://eprints.um.edu.my/7361/
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Institution: Universiti Malaya