Influence of permanent perpendicular magnetic field on the electrodeposition of nickel
This work focuses on the electrodeposition of nickel from a Ni Watt's solution in presence and absence of a permanent perpendicular magnetic field (PPMF) to the cathode surface. It was found that the difference between the mass deposition were enhanced in the presence of PPMF (B = 4.4 T) and in...
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my.um.eprints.75592019-01-31T06:56:30Z http://eprints.um.edu.my/7559/ Influence of permanent perpendicular magnetic field on the electrodeposition of nickel Ebadi, M. Alias, Y. Basirun, Wan Jefrey QD Chemistry This work focuses on the electrodeposition of nickel from a Ni Watt's solution in presence and absence of a permanent perpendicular magnetic field (PPMF) to the cathode surface. It was found that the difference between the mass deposition were enhanced in the presence of PPMF (B = 4.4 T) and in absence of PPMF (B = 0) with increasing of current density (Am = 0.413 to 4.173 mg cm2 in 6 min). The thickness of deposited layers with PPMF was smaller than without PPMF. Therefore, the dense deposited layers were carried out from magneto-electrode position. The Ni Watt's solution contains thiourea as a brightener. The grain size of deposited nickel crystals decreased with PPMF compare to without PPMF. The deposited layers characterized by scanning electron microscopy, X-ray diffraction and atomic force microscopy. 2009 Article PeerReviewed Ebadi, M. and Alias, Y. and Basirun, Wan Jefrey (2009) Influence of permanent perpendicular magnetic field on the electrodeposition of nickel. Asian Journal of Chemistry, 21 (9). pp. 7354-7362. ISSN 09707077 http://www.scopus.com/inward/record.url?eid=2-s2.0-77950195799&partnerID=40&md5=5c035e2943e3bdc522d909d6b37af345 |
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QD Chemistry Ebadi, M. Alias, Y. Basirun, Wan Jefrey Influence of permanent perpendicular magnetic field on the electrodeposition of nickel |
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This work focuses on the electrodeposition of nickel from a Ni Watt's solution in presence and absence of a permanent perpendicular magnetic field (PPMF) to the cathode surface. It was found that the difference between the mass deposition were enhanced in the presence of PPMF (B = 4.4 T) and in absence of PPMF (B = 0) with increasing of current density (Am = 0.413 to 4.173 mg cm2 in 6 min). The thickness of deposited layers with PPMF was smaller than without PPMF. Therefore, the dense deposited layers were carried out from magneto-electrode position. The Ni Watt's solution contains thiourea as a brightener. The grain size of deposited nickel crystals decreased with PPMF compare to without PPMF. The deposited layers characterized by scanning electron microscopy, X-ray diffraction and atomic force microscopy. |
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Article |
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Ebadi, M. Alias, Y. Basirun, Wan Jefrey |
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Ebadi, M. Alias, Y. Basirun, Wan Jefrey |
author_sort |
Ebadi, M. |
title |
Influence of permanent perpendicular magnetic field on the electrodeposition of nickel |
title_short |
Influence of permanent perpendicular magnetic field on the electrodeposition of nickel |
title_full |
Influence of permanent perpendicular magnetic field on the electrodeposition of nickel |
title_fullStr |
Influence of permanent perpendicular magnetic field on the electrodeposition of nickel |
title_full_unstemmed |
Influence of permanent perpendicular magnetic field on the electrodeposition of nickel |
title_sort |
influence of permanent perpendicular magnetic field on the electrodeposition of nickel |
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2009 |
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http://eprints.um.edu.my/7559/ http://www.scopus.com/inward/record.url?eid=2-s2.0-77950195799&partnerID=40&md5=5c035e2943e3bdc522d909d6b37af345 |
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