Water flux prediction of UV-photografted nanofiltration membrane for forward osmosis application

In the application of forward osmosis, commercial nanofiltration (NF) membrane was modified via ultraviolet(UV)-photografting technique at different grafting parameters; monomer concentration (acrylic acid) and grafting time. However, the performance of the modified membrane measured at the osmotic...

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Main Authors: Ahmad Fikri Hadi, Abdul Rahman, Siti Nudra Shafinie, Ab Aziz, Mazrul Nizam, Abu Seman
Format: Conference or Workshop Item
Language:English
Published: Institute of Physics Publishing 2020
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Online Access:http://umpir.ump.edu.my/id/eprint/35977/1/Water%20flux%20prediction%20of%20UV-photografted%20nanofiltration%20membrane%20for%20forward%20osmosis%20application.pdf
http://umpir.ump.edu.my/id/eprint/35977/
https://doi.org/10.1088/1757-899X/736/2/022094
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Institution: Universiti Malaysia Pahang
Language: English
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spelling my.ump.umpir.359772022-12-28T04:37:38Z http://umpir.ump.edu.my/id/eprint/35977/ Water flux prediction of UV-photografted nanofiltration membrane for forward osmosis application Ahmad Fikri Hadi, Abdul Rahman Siti Nudra Shafinie, Ab Aziz Mazrul Nizam, Abu Seman QD Chemistry T Technology (General) TA Engineering (General). Civil engineering (General) TP Chemical technology In the application of forward osmosis, commercial nanofiltration (NF) membrane was modified via ultraviolet(UV)-photografting technique at different grafting parameters; monomer concentration (acrylic acid) and grafting time. However, the performance of the modified membrane measured at the osmotic pressure of 1M NaCl as draw solution limits their applications. In this research, the mathematical modelling was applied to predict the water flux at different osmotic pressure. The mathematical modelling indicated that the generated water flux follows the osmotic pressure but strictly affected by the grafting parameters. The result shows that at grafting time of 3min, the monomer concentration of 15 g/L generates the highest water flux followed by the membrane modified at the monomer concentration of 30 g/L. High water flux was attributed to the presence of strongly hydrophilic groups at new carboxyl layers leading to improved membrane properties. The approach of theoretical modelling on the membrane that is reported in this work allows estimating the water flux at different grafting parameter. Institute of Physics Publishing 2020-03-04 Conference or Workshop Item PeerReviewed pdf en cc_by http://umpir.ump.edu.my/id/eprint/35977/1/Water%20flux%20prediction%20of%20UV-photografted%20nanofiltration%20membrane%20for%20forward%20osmosis%20application.pdf Ahmad Fikri Hadi, Abdul Rahman and Siti Nudra Shafinie, Ab Aziz and Mazrul Nizam, Abu Seman (2020) Water flux prediction of UV-photografted nanofiltration membrane for forward osmosis application. In: IOP Conference Series: Materials Science and Engineering; Energy Security and Chemical Engineering Congress 2019, ESChE 2019, 17-19 July 2019 , Kuala Lumpur. pp. 1-8., 736 (022094). ISSN 1757-8981 https://doi.org/10.1088/1757-899X/736/2/022094
institution Universiti Malaysia Pahang
building UMP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Pahang
content_source UMP Institutional Repository
url_provider http://umpir.ump.edu.my/
language English
topic QD Chemistry
T Technology (General)
TA Engineering (General). Civil engineering (General)
TP Chemical technology
spellingShingle QD Chemistry
T Technology (General)
TA Engineering (General). Civil engineering (General)
TP Chemical technology
Ahmad Fikri Hadi, Abdul Rahman
Siti Nudra Shafinie, Ab Aziz
Mazrul Nizam, Abu Seman
Water flux prediction of UV-photografted nanofiltration membrane for forward osmosis application
description In the application of forward osmosis, commercial nanofiltration (NF) membrane was modified via ultraviolet(UV)-photografting technique at different grafting parameters; monomer concentration (acrylic acid) and grafting time. However, the performance of the modified membrane measured at the osmotic pressure of 1M NaCl as draw solution limits their applications. In this research, the mathematical modelling was applied to predict the water flux at different osmotic pressure. The mathematical modelling indicated that the generated water flux follows the osmotic pressure but strictly affected by the grafting parameters. The result shows that at grafting time of 3min, the monomer concentration of 15 g/L generates the highest water flux followed by the membrane modified at the monomer concentration of 30 g/L. High water flux was attributed to the presence of strongly hydrophilic groups at new carboxyl layers leading to improved membrane properties. The approach of theoretical modelling on the membrane that is reported in this work allows estimating the water flux at different grafting parameter.
format Conference or Workshop Item
author Ahmad Fikri Hadi, Abdul Rahman
Siti Nudra Shafinie, Ab Aziz
Mazrul Nizam, Abu Seman
author_facet Ahmad Fikri Hadi, Abdul Rahman
Siti Nudra Shafinie, Ab Aziz
Mazrul Nizam, Abu Seman
author_sort Ahmad Fikri Hadi, Abdul Rahman
title Water flux prediction of UV-photografted nanofiltration membrane for forward osmosis application
title_short Water flux prediction of UV-photografted nanofiltration membrane for forward osmosis application
title_full Water flux prediction of UV-photografted nanofiltration membrane for forward osmosis application
title_fullStr Water flux prediction of UV-photografted nanofiltration membrane for forward osmosis application
title_full_unstemmed Water flux prediction of UV-photografted nanofiltration membrane for forward osmosis application
title_sort water flux prediction of uv-photografted nanofiltration membrane for forward osmosis application
publisher Institute of Physics Publishing
publishDate 2020
url http://umpir.ump.edu.my/id/eprint/35977/1/Water%20flux%20prediction%20of%20UV-photografted%20nanofiltration%20membrane%20for%20forward%20osmosis%20application.pdf
http://umpir.ump.edu.my/id/eprint/35977/
https://doi.org/10.1088/1757-899X/736/2/022094
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