Photocatalytic performance of acid exfoliated graphitic carbon nitride (g-C3N4) for the degradation of dye under direct sunlight
Graphitic carbon nitride (g-C3N4) is one of the most promising semiconductor materials applied in photocatalytic applications. However, the photocatalytic performance of bulk g-C3N4 was not satisfactory due to poor visible-light absorption, quick recombination, and low amount of active interfacial r...
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Main Authors: | , , , , , , , , |
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Format: | Article |
Language: | English English |
Published: |
Elsevier B.V.
2024
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Subjects: | |
Online Access: | http://umpir.ump.edu.my/id/eprint/42949/1/Photocatalytic%20performance%20of%20acid%20exfoliated%20graphitic%20carbon%20nitride_ABST.pdf http://umpir.ump.edu.my/id/eprint/42949/2/Photocatalytic%20performance%20of%20acid%20exfoliated%20graphitic%20carbon%20nitride.pdf http://umpir.ump.edu.my/id/eprint/42949/ https://doi.org/10.1016/j.flatc.2024.100762 https://doi.org/10.1016/j.flatc.2024.100762 |
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Institution: | Universiti Malaysia Pahang Al-Sultan Abdullah |
Language: | English English |
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http://umpir.ump.edu.my/id/eprint/42949/1/Photocatalytic%20performance%20of%20acid%20exfoliated%20graphitic%20carbon%20nitride_ABST.pdfhttp://umpir.ump.edu.my/id/eprint/42949/2/Photocatalytic%20performance%20of%20acid%20exfoliated%20graphitic%20carbon%20nitride.pdf
http://umpir.ump.edu.my/id/eprint/42949/
https://doi.org/10.1016/j.flatc.2024.100762
https://doi.org/10.1016/j.flatc.2024.100762