Application of e-beam lithography for nanowire development

• Main Authors: S. Fatimah, Abd Rahman, Uda, Hashim, Prof. Dr., Mohammad Nuzaihan, Md Nor
• Other Authors: [e-mail]
• Format: Working Paper
• Language: English
• Published: Universiti Malaysia Perlis (UniMAP) 2012
• Subjects: Semiconductor device; Electron beam lithography (EBL); Photolithography; Nanowires
• Online Access: http://dspace.unimap.edu.my/xmlui/handle/123456789/21642
• Institution: Universiti Malaysia Perlis

International Postgraduate Conference On Engineering (IPCE 2010), 16th - 17th October 2010 organized by Centre for Graduate Studies, Universiti Malaysia Perlis (UniMAP) at School of Mechatronic Engineering, Pauh Putra Campus, Perlis, Malaysia.