The effect of pulse DC and DC substrate bias during in situ cleaning PVD process on surface roughness

The effect of pulse DC and DC substrate bias during in situ cleaning PVD process on surface roughness

Malaysian Technical Universities Conference on Engineering and Technology (MUCET) 2012 organised by technical universities under the Malaysian Technical Universities Network (MTUN), 20th - 21st November 2012 at Hotel Seri Malaysia, Kangar, Perlis, Malaysia.

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Bibliographic Details
Main Authors: Hanizam, Hashim, Mohd Saufhwee, Abd Rahman, Anuar, A.R, K., Md. Nizam, Abd. Rahman, Dr., Noraiham, Mohamad, Dr.
Other Authors: hanizam@utem.edu.my
Format: Working Paper
Language:English
Published: Malaysian Technical Universities Network (MTUN) 2013
Subjects:
Physical vapor deposition
Surface roughness
Substrate bias
Pulse direct current
Tungsten carbide
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/27355
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Institution: Universiti Malaysia Perlis
Language: English
Description
Summary:Malaysian Technical Universities Conference on Engineering and Technology (MUCET) 2012 organised by technical universities under the Malaysian Technical Universities Network (MTUN), 20th - 21st November 2012 at Hotel Seri Malaysia, Kangar, Perlis, Malaysia.

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