Nanowire formation for single electron transistor using SEM based Electron Beam Lithography (EBL) technique: Positive tone vs negative tone e-beam resist

Nanowire formation for single electron transistor using SEM based Electron Beam Lithography (EBL) technique: Positive tone vs negative tone e-beam resist

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Bibliographic Details
Main Authors: Mohammad Nuzaihan, Md Nor, Uda, Hashim, Nur Hamidah, Abdul Halim, Bajuri, S. N M
Format: Article
Language:English
Published: Nano Science and Technology Institute 2009
Subjects:
Electron beam lithography
ma-N 2405 resist
Nanowires
PMMA
Scanning electron microscope
Nanotechnology
Nanowires > Design and construction
Nanostructured materials
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/6977
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Institution: Universiti Malaysia Perlis
Language: English

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http://dspace.unimap.edu.my/xmlui/handle/123456789/6977

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