Interplay between variable direct current sputtering deposition process parameters and properties of ZnO:Ga thin films
Conductive films; Gallium compounds; Grain growth; II-VI semiconductors; Infrared spectroscopy; Oxide films; Sputtering; Zinc oxide; Gallium doped zinc oxides; Optoelectronic properties; Spatial variations; Sputtering deposition; Transparent conductive oxides; Thin films
Saved in:
| Main Authors: | , , , , , , |
|---|---|
| Other Authors: | |
| Format: | Article |
| Published: |
Elsevier B.V.
2023
|
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | Universiti Tenaga Nasional |
| Summary: | Conductive films; Gallium compounds; Grain growth; II-VI semiconductors; Infrared spectroscopy; Oxide films; Sputtering; Zinc oxide; Gallium doped zinc oxides; Optoelectronic properties; Spatial variations; Sputtering deposition; Transparent conductive oxides; Thin films |
|---|