Influence of oxygen on structural and optoelectronic properties of CdS thin film deposited by magnetron sputtering technique

In this study, CdS thin films with thicknesses of approximately 100 nm were deposited at a substrate temperature of 100 �C by a sputtering technique under two different ambient conditions�pure Ar ambient and Ar/O2 (99:1) ambient�at deposition power densities of 1.0 and 2.0 W/cm2, respectively The fi...

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Main Authors: Islam M.A., Hatta S.F.W.M., Misran H., Akhtaruzzaman M., Amin N.
Other Authors: 57220973693
Format: Article
Published: Physical Society of the Republic of China 2023
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Institution: Universiti Tenaga Nasional
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spelling my.uniten.dspace-252122023-05-29T16:07:23Z Influence of oxygen on structural and optoelectronic properties of CdS thin film deposited by magnetron sputtering technique Islam M.A. Hatta S.F.W.M. Misran H. Akhtaruzzaman M. Amin N. 57220973693 22634464300 6506899840 57195441001 7102424614 In this study, CdS thin films with thicknesses of approximately 100 nm were deposited at a substrate temperature of 100 �C by a sputtering technique under two different ambient conditions�pure Ar ambient and Ar/O2 (99:1) ambient�at deposition power densities of 1.0 and 2.0 W/cm2, respectively The films were polycrystalline with a preferential orientation along the (002) crystal plane; however, the films deposited in the Ar/O2 ambient exhibited reduced crystallinity. Furthermore, the crystallite sizes, micro-strains, and dislocation densities of the films were significantly affected by oxygen diffusion into the films� crystal structures. The CdS films deposited in the Ar/O2 ambient demonstrated higher optical transmittance and higher bandgaps. Morphologies observed from scanning electron microscopy images revealed that the grains of the films were also significantly affected by the oxygen present in the deposition ambient. Additionally, photoluminescence analysis revealed that the sulfur vacancies in the CdS films were partially filled by oxygen atoms, causing significant variations in the electrical properties of the films. � 2020 The Physical Society of the Republic of China (Taiwan) Final 2023-05-29T08:07:23Z 2023-05-29T08:07:23Z 2020 Article 10.1016/j.cjph.2020.06.010 2-s2.0-85088659372 https://www.scopus.com/inward/record.uri?eid=2-s2.0-85088659372&doi=10.1016%2fj.cjph.2020.06.010&partnerID=40&md5=e1cbc66250c4a2d091322a009ec5846b https://irepository.uniten.edu.my/handle/123456789/25212 67 170 179 Physical Society of the Republic of China Scopus
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description In this study, CdS thin films with thicknesses of approximately 100 nm were deposited at a substrate temperature of 100 �C by a sputtering technique under two different ambient conditions�pure Ar ambient and Ar/O2 (99:1) ambient�at deposition power densities of 1.0 and 2.0 W/cm2, respectively The films were polycrystalline with a preferential orientation along the (002) crystal plane; however, the films deposited in the Ar/O2 ambient exhibited reduced crystallinity. Furthermore, the crystallite sizes, micro-strains, and dislocation densities of the films were significantly affected by oxygen diffusion into the films� crystal structures. The CdS films deposited in the Ar/O2 ambient demonstrated higher optical transmittance and higher bandgaps. Morphologies observed from scanning electron microscopy images revealed that the grains of the films were also significantly affected by the oxygen present in the deposition ambient. Additionally, photoluminescence analysis revealed that the sulfur vacancies in the CdS films were partially filled by oxygen atoms, causing significant variations in the electrical properties of the films. � 2020 The Physical Society of the Republic of China (Taiwan)
author2 57220973693
author_facet 57220973693
Islam M.A.
Hatta S.F.W.M.
Misran H.
Akhtaruzzaman M.
Amin N.
format Article
author Islam M.A.
Hatta S.F.W.M.
Misran H.
Akhtaruzzaman M.
Amin N.
spellingShingle Islam M.A.
Hatta S.F.W.M.
Misran H.
Akhtaruzzaman M.
Amin N.
Influence of oxygen on structural and optoelectronic properties of CdS thin film deposited by magnetron sputtering technique
author_sort Islam M.A.
title Influence of oxygen on structural and optoelectronic properties of CdS thin film deposited by magnetron sputtering technique
title_short Influence of oxygen on structural and optoelectronic properties of CdS thin film deposited by magnetron sputtering technique
title_full Influence of oxygen on structural and optoelectronic properties of CdS thin film deposited by magnetron sputtering technique
title_fullStr Influence of oxygen on structural and optoelectronic properties of CdS thin film deposited by magnetron sputtering technique
title_full_unstemmed Influence of oxygen on structural and optoelectronic properties of CdS thin film deposited by magnetron sputtering technique
title_sort influence of oxygen on structural and optoelectronic properties of cds thin film deposited by magnetron sputtering technique
publisher Physical Society of the Republic of China
publishDate 2023
_version_ 1806426005688025088