High-Aspect-Ratio Silicon Nanostructures on N-type Silicon Wafer Using Metal-Assisted Chemical Etching (MACE) Technique

• Main Authors: Razak N.H.A., Amin N., Kiong T.S., Sopian K., Akhtaruzzaman M.
• Other Authors: 54397656800
• Format: Conference Paper
• Published: Institute of Electrical and Electronics Engineers Inc. 2023
• Institution: Universiti Tenaga Nasional

Aspect ratio; Catalysts; Etching; Hydrofluoric acid; Light; Metals; Photons; Porosity; Silicon solar cells; Silicon wafers; Surface roughness; Textures; Chemical etching technique; High aspect ratio; High aspect ratio microstructures; Metal-assisted chemical etching; Nanowire formation; Roughness pa...