Effect of surface roughness of TiO2 films on short-circuit current density of photoelectrochemical cell of ITO/TiO2/ PVC-LiClO4/graphite
This paper reports the effect of surface topography of titanium dioxide films on short-circuit current density of photoelectrochemical solar cell of ITO/TiO2/PVC-LiCLO4/graphite. The films were deposited onto ITO-covered glass substrate by screen-printing technique. The films were tempered at 300�C,...
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my.uniten.dspace-299292023-12-28T16:58:19Z Effect of surface roughness of TiO2 films on short-circuit current density of photoelectrochemical cell of ITO/TiO2/ PVC-LiClO4/graphite Rahman M.Y.A. Salleh M.M. Talib I.A. Yahaya M. 55347217400 55613229960 7801465202 7003350598 Photoelectrochemical cell Screen-printing technique Surface topography Titanium dioxide Current density Current voltage characteristics Films Photoelectrochemical cells Porous materials Scanning electron microscopy Screen printing Short circuit currents Solar cells Substrates Surface roughness Surface topography Open circuit voltage Short circuit current density Titanium dioxide films Titanium dioxide This paper reports the effect of surface topography of titanium dioxide films on short-circuit current density of photoelectrochemical solar cell of ITO/TiO2/PVC-LiCLO4/graphite. The films were deposited onto ITO-covered glass substrate by screen-printing technique. The films were tempered at 300�C, 350�C, 400�C, 450�C and 500�C for 30 min to burn out the organic parts and to achieve the films with porous structure. The surface roughness of the films were studied using scanning electron microscope (SEM). Current-voltage relationship of the devices were characterized in dark at room temperature and under illumination of 100 mW cm-2 light from tungsten halogen lamp at 50�C. The device utilising the TiO2 film annealed at 400�C produces the highest short-circuit current density and open-circuit voltage as it posses the smoothest surface topography with the electrolyte. The short-circuit current density and open-circuit voltage of the devices increase with the decreasing grain size of the TiO2 films. The short-circuit current density and open-circuit voltage are 0.6 ?A/cm2 and 109 mV respectively. � 2004 Elsevier B.V. All rights reserved. Final 2023-12-28T08:58:18Z 2023-12-28T08:58:18Z 2005 Article 10.1016/j.cap.2004.08.003 2-s2.0-22144450708 https://www.scopus.com/inward/record.uri?eid=2-s2.0-22144450708&doi=10.1016%2fj.cap.2004.08.003&partnerID=40&md5=ce8806f55a64db60f52545b02a28bdd6 https://irepository.uniten.edu.my/handle/123456789/29929 5 6 599 602 Scopus |
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Photoelectrochemical cell Screen-printing technique Surface topography Titanium dioxide Current density Current voltage characteristics Films Photoelectrochemical cells Porous materials Scanning electron microscopy Screen printing Short circuit currents Solar cells Substrates Surface roughness Surface topography Open circuit voltage Short circuit current density Titanium dioxide films Titanium dioxide |
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Photoelectrochemical cell Screen-printing technique Surface topography Titanium dioxide Current density Current voltage characteristics Films Photoelectrochemical cells Porous materials Scanning electron microscopy Screen printing Short circuit currents Solar cells Substrates Surface roughness Surface topography Open circuit voltage Short circuit current density Titanium dioxide films Titanium dioxide Rahman M.Y.A. Salleh M.M. Talib I.A. Yahaya M. Effect of surface roughness of TiO2 films on short-circuit current density of photoelectrochemical cell of ITO/TiO2/ PVC-LiClO4/graphite |
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This paper reports the effect of surface topography of titanium dioxide films on short-circuit current density of photoelectrochemical solar cell of ITO/TiO2/PVC-LiCLO4/graphite. The films were deposited onto ITO-covered glass substrate by screen-printing technique. The films were tempered at 300�C, 350�C, 400�C, 450�C and 500�C for 30 min to burn out the organic parts and to achieve the films with porous structure. The surface roughness of the films were studied using scanning electron microscope (SEM). Current-voltage relationship of the devices were characterized in dark at room temperature and under illumination of 100 mW cm-2 light from tungsten halogen lamp at 50�C. The device utilising the TiO2 film annealed at 400�C produces the highest short-circuit current density and open-circuit voltage as it posses the smoothest surface topography with the electrolyte. The short-circuit current density and open-circuit voltage of the devices increase with the decreasing grain size of the TiO2 films. The short-circuit current density and open-circuit voltage are 0.6 ?A/cm2 and 109 mV respectively. � 2004 Elsevier B.V. All rights reserved. |
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55347217400 |
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55347217400 Rahman M.Y.A. Salleh M.M. Talib I.A. Yahaya M. |
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Article |
author |
Rahman M.Y.A. Salleh M.M. Talib I.A. Yahaya M. |
author_sort |
Rahman M.Y.A. |
title |
Effect of surface roughness of TiO2 films on short-circuit current density of photoelectrochemical cell of ITO/TiO2/ PVC-LiClO4/graphite |
title_short |
Effect of surface roughness of TiO2 films on short-circuit current density of photoelectrochemical cell of ITO/TiO2/ PVC-LiClO4/graphite |
title_full |
Effect of surface roughness of TiO2 films on short-circuit current density of photoelectrochemical cell of ITO/TiO2/ PVC-LiClO4/graphite |
title_fullStr |
Effect of surface roughness of TiO2 films on short-circuit current density of photoelectrochemical cell of ITO/TiO2/ PVC-LiClO4/graphite |
title_full_unstemmed |
Effect of surface roughness of TiO2 films on short-circuit current density of photoelectrochemical cell of ITO/TiO2/ PVC-LiClO4/graphite |
title_sort |
effect of surface roughness of tio2 films on short-circuit current density of photoelectrochemical cell of ito/tio2/ pvc-liclo4/graphite |
publishDate |
2023 |
_version_ |
1806428510808440832 |