Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source
The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N2 and H2 gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a high deg...
Saved in:
| Main Author: | |
|---|---|
| Format: | Article |
| Language: | en_US |
| Published: |
2017
|
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | Universiti Tenaga Nasional |
| Language: | en_US |
| id |
my.uniten.dspace-5748 |
|---|---|
| record_format |
dspace |
| spelling |
my.uniten.dspace-57482017-12-14T01:25:25Z Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source Chakrabarty, C.K. The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N2 and H2 gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a high degree of measurement error. This paper hence describes the use of a centre-tapped coiled magnetic probe for the measurement of magnetic field profiles in 1-D in the low frequency RF inductively coupled plasma source. From these profiles, an independent method to determine the average electron density is also shown. © 2006 Elsevier Ltd. All rights reserved. 2017-12-08T06:45:51Z 2017-12-08T06:45:51Z 2006 Article 10.1016/j.measurement.2006.03.003 en_US Measurement: Journal of the International Measurement Confederation Volume 39, Issue 8, October 2006, Pages 736-739 |
| institution |
Universiti Tenaga Nasional |
| building |
UNITEN Library |
| collection |
Institutional Repository |
| continent |
Asia |
| country |
Malaysia |
| content_provider |
Universiti Tenaga Nasional |
| content_source |
UNITEN Institutional Repository |
| url_provider |
http://dspace.uniten.edu.my/ |
| language |
en_US |
| description |
The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N2 and H2 gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a high degree of measurement error. This paper hence describes the use of a centre-tapped coiled magnetic probe for the measurement of magnetic field profiles in 1-D in the low frequency RF inductively coupled plasma source. From these profiles, an independent method to determine the average electron density is also shown. © 2006 Elsevier Ltd. All rights reserved. |
| format |
Article |
| author |
Chakrabarty, C.K. |
| spellingShingle |
Chakrabarty, C.K. Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source |
| author_facet |
Chakrabarty, C.K. |
| author_sort |
Chakrabarty, C.K. |
| title |
Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source |
| title_short |
Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source |
| title_full |
Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source |
| title_fullStr |
Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source |
| title_full_unstemmed |
Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source |
| title_sort |
magnetic field measurements for n2 and h2 discharges from a low frequency rf inductively coupled plasma source |
| publishDate |
2017 |
| _version_ |
1644493765919899648 |