Studies Of The Effect Of Post Deposition Annealing To The Ceo2 Thin Film On P-Type Silicon And N-Type Silicon Carbide Substrates

Cerium Oxide (CeO2) thin film has been deposited on silicon (Si) and silicon carbide (SiC) substrates using a radio frequency magnetron sputtering technique. The effect of post deposition annealing at different temperatures (400, 600, 800 and 1000oC) in argon (Ar) ambient for 30 minutes has been inv...

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Main Author:	Chuah, Soo Kiet
Format:	Thesis
Language:	English
Published:	2011
Subjects:	TN1-997 Mining engineering. Metallurgy
Online Access:	http://eprints.usm.my/43243/1/CHUAH%20SOO%20KIET.pdf http://eprints.usm.my/43243/
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Institution:	Universiti Sains Malaysia
Language:	English

id	my.usm.eprints.43243
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spelling	my.usm.eprints.43243 http://eprints.usm.my/43243/ Studies Of The Effect Of Post Deposition Annealing To The Ceo2 Thin Film On P-Type Silicon And N-Type Silicon Carbide Substrates Chuah, Soo Kiet TN1-997 Mining engineering. Metallurgy Cerium Oxide (CeO2) thin film has been deposited on silicon (Si) and silicon carbide (SiC) substrates using a radio frequency magnetron sputtering technique. The effect of post deposition annealing at different temperatures (400, 600, 800 and 1000oC) in argon (Ar) ambient for 30 minutes has been investigated on p-type Si and n-type SiC substrates. The thickness of the CeO2 thin films on Si and SiC substrates are in the range of 30 to 40 nm. Field emission scanning electron microscopy and atomic force microscopy show that both CeO2 thin films on Si and SiC substrates are free of physical defects and the root mean square surface roughness are decreasing as the annealing temperature increases. 2011-10 Thesis NonPeerReviewed application/pdf en http://eprints.usm.my/43243/1/CHUAH%20SOO%20KIET.pdf Chuah, Soo Kiet (2011) Studies Of The Effect Of Post Deposition Annealing To The Ceo2 Thin Film On P-Type Silicon And N-Type Silicon Carbide Substrates. Masters thesis, Universiti Sains Malaysia.
institution	Universiti Sains Malaysia
building	Hamzah Sendut Library
collection	Institutional Repository
continent	Asia
country	Malaysia
content_provider	Universiti Sains Malaysia
content_source	USM Institutional Repository
url_provider	http://eprints.usm.my/
language	English
topic	TN1-997 Mining engineering. Metallurgy
spellingShingle	TN1-997 Mining engineering. Metallurgy Chuah, Soo Kiet Studies Of The Effect Of Post Deposition Annealing To The Ceo2 Thin Film On P-Type Silicon And N-Type Silicon Carbide Substrates
description	Cerium Oxide (CeO2) thin film has been deposited on silicon (Si) and silicon carbide (SiC) substrates using a radio frequency magnetron sputtering technique. The effect of post deposition annealing at different temperatures (400, 600, 800 and 1000oC) in argon (Ar) ambient for 30 minutes has been investigated on p-type Si and n-type SiC substrates. The thickness of the CeO2 thin films on Si and SiC substrates are in the range of 30 to 40 nm. Field emission scanning electron microscopy and atomic force microscopy show that both CeO2 thin films on Si and SiC substrates are free of physical defects and the root mean square surface roughness are decreasing as the annealing temperature increases.
format	Thesis
author	Chuah, Soo Kiet
author_facet	Chuah, Soo Kiet
author_sort	Chuah, Soo Kiet
title	Studies Of The Effect Of Post Deposition Annealing To The Ceo2 Thin Film On P-Type Silicon And N-Type Silicon Carbide Substrates
title_short	Studies Of The Effect Of Post Deposition Annealing To The Ceo2 Thin Film On P-Type Silicon And N-Type Silicon Carbide Substrates
title_full	Studies Of The Effect Of Post Deposition Annealing To The Ceo2 Thin Film On P-Type Silicon And N-Type Silicon Carbide Substrates
title_fullStr	Studies Of The Effect Of Post Deposition Annealing To The Ceo2 Thin Film On P-Type Silicon And N-Type Silicon Carbide Substrates
title_full_unstemmed	Studies Of The Effect Of Post Deposition Annealing To The Ceo2 Thin Film On P-Type Silicon And N-Type Silicon Carbide Substrates
title_sort	studies of the effect of post deposition annealing to the ceo2 thin film on p-type silicon and n-type silicon carbide substrates
publishDate	2011
url	http://eprints.usm.my/43243/1/CHUAH%20SOO%20KIET.pdf http://eprints.usm.my/43243/
_version_	1643710698243489792

Studies Of The Effect Of Post Deposition Annealing To The Ceo2 Thin Film On P-Type Silicon And N-Type Silicon Carbide Substrates

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