Remote global alignment error for cycle time improvement of pad inductor layer
Lithography is the key process which transfers the pattern from mask (reticle) to wafer; and pad inductor layer is the last layer in photo masking. The cycle time for pad inductor layer has increased in Silterra Malaysia Sdn. Bhd., by 32% per month due to Global Alignment (GA) error. Meanwhile, engi...
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| Format: | Thesis |
| Language: | English English |
| Published: |
2018
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| Subjects: | |
| Online Access: | http://eprints.utem.edu.my/id/eprint/23781/1/Remote%20Global%20Alignment%20Error%20For%20Cycle%20Time%20Improvement%20Of%20Pad%20Inductor%20Layer.pdf http://eprints.utem.edu.my/id/eprint/23781/2/Remote%20global%20alignment%20error%20for%20cycle%20time%20improvement%20of%20pad%20inductor%20layer.pdf http://eprints.utem.edu.my/id/eprint/23781/ http://plh.utem.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=112889 |
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| Institution: | Universiti Teknikal Malaysia Melaka |
| Language: | English English |
Internet
http://eprints.utem.edu.my/id/eprint/23781/1/Remote%20Global%20Alignment%20Error%20For%20Cycle%20Time%20Improvement%20Of%20Pad%20Inductor%20Layer.pdfhttp://eprints.utem.edu.my/id/eprint/23781/2/Remote%20global%20alignment%20error%20for%20cycle%20time%20improvement%20of%20pad%20inductor%20layer.pdf
http://eprints.utem.edu.my/id/eprint/23781/
http://plh.utem.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=112889