Ion Track Nanolithography Using Thick Cross-Linked Poly(methyl methacrylate) 950 Photoresist

• Main Authors: Koukharenko, Elena, Jekaterina , Kuleshova, Fowler, Marcel, Kok, Swee Leong, Tudor, Michael J., Beeby, Stephen P., Nandhakumar, Iris, White, Neil
• Format: Article
• Published: Jpn. J. Appl. Phys. 2010
• Subjects: TK Electrical engineering. Electronics Nuclear engineering
• Online Access: http://eprints.utem.edu.my/id/eprint/4371/; http://jjap.jsap.jp/link?JJAP/49/06GE07/
• Institution: Universiti Teknikal Malaysia Melaka

This study shows that poly(methyl methacrylate) (PMMA) 950 thick photoresist is a promising polymer for ion-track nanolithography templates for nanomaterials fabrication resulting in high aspect ratio nanostructures ranging from 100 to 500 with highly selective etch rates when using deep ultraviolet...