ELECTROSYNTHESIZED NiS2 THIN FILMS AND THEIR CHARACTERIZATION STUDIES

• Main Authors: K.M. Rajan, Rajes, Abdul Aziz, Mohd Zaidan Bin, T., Joseph Sahaya Anand
• Format: Conference or Workshop Item
• Language: English
• Published: 2012
• Subjects: TJ Mechanical engineering and machinery
• Online Access: http://eprints.utem.edu.my/id/eprint/6962/1/idecon2012_Anand_125.pdf; http://eprints.utem.edu.my/id/eprint/6962/; http://idecon.utem.edu.my/
• Institution: Universiti Teknikal Malaysia Melaka

Nickel Sufide (NiS2) thin films were prepared by using Electrodeposition on Indium-tin Oxide coated glass (ITO). Films are characterized using X-ray diffraction for their crystallographic analysis. From scanning electron micrographs, the surface appears to be comparatively granular with grains in irregularly shaped. From optical analysis, the bandgap range is between 1.22- 1.15eV with indirect band gap nature. From Mott-Schottky plots the films are found to be n-type and the semiconductor parameters of the film are derived. Films show polycrystalline in nature with good uniformity.