The Effect of Pulse DC and DC Substrate Bias during In Situ Cleaning PVD Process on Surface Roughness

The Effect of Pulse DC and DC Substrate Bias during In Situ Cleaning PVD Process on Surface Roughness

Surface morphology modification during in situ cleaning of physical vapor deposition (PVD) process is essential to strengthen and prevent unexpected adhesion failure during machining. Applying pulse direct current (PDC) on substrate bias is still uncommon compared to a conventional direct current (D...

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Bibliographic Details
Main Authors: Hashim, Hanizam, Md Nizam, Abd Rahman, Noraiham, Mohamad, Khairul Anuar, Abd Rahman
Format: Article
Language:English
Published: Elsevier Ltd 2013
Subjects:
TS Manufactures
Online Access:http://eprints.utem.edu.my/id/eprint/7078/1/Hanizam-mucet2012.pdf
http://eprints.utem.edu.my/id/eprint/7078/
http://authors.elsevier.com/sd/article/S1877705813001914
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Institution: Universiti Teknikal Malaysia Melaka
Language: English

Internet

http://eprints.utem.edu.my/id/eprint/7078/1/Hanizam-mucet2012.pdf
http://eprints.utem.edu.my/id/eprint/7078/
http://authors.elsevier.com/sd/article/S1877705813001914

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