Surface Energy and Crystallite Size Comparisons by Applying Direct Current and Pulse Direct Current on Substrate Bias in PVD Process

Surface morphology homogeneity and energy modifications for in situ PVD process are two critical factors to prevent unexpected adhesion failure during machining or service. Unlike during film depositing, there is still much gap to be explored on applying pulsed biasing concepts to the substrate duri...

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Bibliographic Details
Main Authors: Hashim, Hanizam, Md Nizam, Abd Rahman, Noraiham, Mohamad, Mohd Soufhwee, Abd Rahman
Format: Article
Language:English
Published: Trans Tech Publications, Switzerland 2013
Subjects:
Online Access:http://eprints.utem.edu.my/id/eprint/7079/1/Hanizam-ICME2012.pdf
http://eprints.utem.edu.my/id/eprint/7079/
http://www.ttp.net/1660-9336.html
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Institution: Universiti Teknikal Malaysia Melaka
Language: English
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