Growth of TiO2 thin films by Atomic Layer Deposition (ALD)
Ceramic oxide thin films are an important material, with applications in many areas of science and technology. Titanium oxide (TiO2) is also a well-known and important material for applications such as gas sensors [1], photocatalysis materials [3], and electrochemicals [1], due to its self-cleaning...
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| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Trans Tech Publications
2016
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| Subjects: | |
| Online Access: | http://eprints.uthm.edu.my/5621/1/AJ%202016%20%28103%29.pdf http://eprints.uthm.edu.my/5621/ http://dx.doi.org/10.4028/www.scientific.net/AMR.1133.352 |
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| Institution: | Universiti Tun Hussein Onn Malaysia |
| Language: | English |