Effect of plasma power and flow rate of silane gas on diameter of silicon nanowires by plasma enhanced chemical vapor deposition
Silicon nanowires (SiNWs) have been synthesized by plasma enhanced chemical vapor deposition (PECVD) at different power for generation of plasma and different flow rate of silane gas. Silane (10% SiH4 in Ar) gas with flow rate ranging between 6-15 standard cubic centimeter per minute(sccm) were empl...
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| Main Authors: | , , , |
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| Format: | Conference or Workshop Item |
| Published: |
2009
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| Subjects: | |
| Online Access: | http://eprints.utm.my/id/eprint/15118/ |
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| Institution: | Universiti Teknologi Malaysia |